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Report -
3. Untersuchungen an dunnen¨ SiO -Schichtensundoc.bibliothek.uni-halle.de/diss-online/01/01A7161/t4.pdf3. Untersuchungenandunnen¨ SiOx-Schichten % O in SiO x 50 55 60 Stöchiometrie
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